Please use this identifier to cite or link to this item: http://hdl.handle.net/10603/40032
Title: Effects of Process variation on the performance parameters of VLSI interconnects
Researcher: K.G Verma
Guide(s): Kaushik, B.K.;Singh , Raghuvir
Keywords: Interlayer capacitance, Chemical mechanical planarization, Optical proximity correction
Upload Date: 5-May-2015
University: Shobhit University
Completed Date: 20/08/2011
Abstract: newline
Pagination: 
URI: http://hdl.handle.net/10603/40032
Appears in Departments:Faculty of Engineering and Technology

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